Composition for forming conductive pattern by irradiation of electromagnetic waves, method for forming conductive pattern using same, and resin structure having conductive pattern

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United States of America Patent

PATENT NO 10837114
APP PUB NO 20170275764A1
SERIAL NO

15510967

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Abstract

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The present invention relates to a composition for forming a conductive pattern by irradiation of electromagnetic waves capable of allowing excellent formation of a conductive micro-pattern on various polymer resin products comprising a polycarbonate resin or on resin layers by a simple method such as irradiation of electromagnetic waves and plating, and capable of reducing the degradation of the physical properties of the resin products or resin layers caused by the irradiation of electromagnetic waves, a method for forming a conductive pattern using the same, and a resin structure having a conductive pattern. The composition for forming a conductive pattern by irradiation of electromagnetic waves comprises: a polymer resin comprising a polycarbonate resin; and an electromagnetic wave-absorbing inorganic additive which absorbs an electromagnetic wave having a wavelength in the infrared region and satisfies the characteristic that a laser sensitivity Ls defined by a predetermined relational expression is 1.6<−log(Ls)<6.0.

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Patent Owner(s)

Patent OwnerAddress
LG CHEM LTDYOUNGDUNGPO-GU SEOUL 150-721

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jeong, Han Nah Daejeon, KR 25 37
Jun, Shin Hee Daejeon, KR 29 46
Kim, Jae Hyun Daejeon, KR 259 2059
Kim, Jae Jin Daejeon, KR 69 385
Park, Chee-Sung Daejeon, KR 18 35
Park, Cheol-Hee Daejeon, KR 79 245
Shin, Bu Gon Daejeon, KR 72 283

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