Gas distribution showerhead for semiconductor processing
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United States of America Patent
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Nov 10, 2020
Grant Date -
Nov 23, 2017
app pub date -
Apr 20, 2017
filing date -
May 20, 2016
priority date (Note) -
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Abstract
Embodiments disclosed herein generally relate to a gas distribution assembly for providing improved uniform distribution of processing gases into a semiconductor processing chamber. The gas distribution assembly includes a gas distribution plate, a blocker plate, and a dual zone showerhead. The gas distribution assembly provides for independent center to edge flow zonality, independent two precursor delivery, two precursor mixing via a mixing manifold, and recursive mass flow distribution in the gas distribution plate.
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