Charge stripping film for ion beam
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United States of America Patent
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Nov 3, 2020
Grant Date -
May 23, 2019
app pub date -
Jan 25, 2019
filing date -
Apr 15, 2015
priority date (Note) -
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Abstract
A charge stripping method includes irradiating a charge stripping film with an ion beam. The charge stripping film includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25° C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of not less than 100 nm and less than 10 μm, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of not more than 1×10−5/K, and an area of at least 4 cm2.
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