Image-based overlay metrology and monitoring using through-focus imaging
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United States of America Patent
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Oct 27, 2020
Grant Date -
Jan 24, 2019
app pub date -
Jul 12, 2018
filing date -
Jul 18, 2017
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Abstract
A metrology system includes a controller coupled to a detector to image a sample based on the light captured by an objective lens, where an object plane of the detector with respect to the sample is adjustable. The controller may direct the detector to generate reference images of an overlay target on the sample at multiple object planes including at least a first reference image at a first sample layer and a second reference image at a second sample layer. The controller may further determine a reference overlay between the first layer and the second layer at the overlay target based on the first reference image and the second reference image. The controller may further select a measurement object plane for single-image overlay determination that corresponds to the reference overlay within a selected tolerance. The controller may further determine overlay for additional overlay targets at the measurement plane.
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