Photomask and fabrication method therefor

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10816891
APP PUB NO 20180164675A1
SERIAL NO

15481009

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Abstract

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A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Hao-Ming Hsinchu, TW 59 184
Chu, Yuan-Chih New Taipei, TW 23 92
Hsu, S C Sijhih, TW 1 4
Lai, Chien-Hung Taichung, TW 32 356
Lin, Cheng-Ming Siluo Township, TW 100 187
Wang, Hsuan-Wen Hsinchu, TW 10 105
Wei, Shao-Chi Hsinchu, TW 15 17
Yang, Min-An Taichung, TW 5 16

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