Apparatus and method for measuring topography and gradient of the surfaces, shape, and thickness of patterned and unpatterned wafers
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 20, 2020
Grant Date -
N/A
app pub date -
Jul 19, 2019
filing date -
Jul 24, 2018
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An interferometer system may include a stage assembly configured to receive and secure a sample, an illumination source configured to generate an illumination beam, a half-wave plate, one or more shearing prisms to shear the illumination beam into two beamlets along a shearing direction, a reference flat disposed proximate to the sample, a detector assembly, and a controller. The controller may cause the illumination source to generate an illumination beam and sweep the illumination beam across a plurality of wavelengths, and determine both a surface height measurement and a surface slope measurement of the sample based on the illumination received by the detector assembly.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully