Method for discharging static charges on reticle
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United States of America Patent
Stats
-
Oct 13, 2020
Grant Date -
May 23, 2019
app pub date -
Jan 31, 2018
filing date -
Nov 21, 2017
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A reticle, a reticle container and a method for discharging static charges accumulated on a reticle are provided. The reticle includes a mask substrate, a reflective multilayer (ML) structure, a capping layer, an absorption structure and a conductive material structure. The mask substrate has a front-side surface and a back-side surface. The reflective ML structure is positioned over the front-side surface of mask substrate. The capping layer is positioned over the reflective ML structure. The absorption structure is positioned over the capping layer. The conductive material structure is positioned over a sidewall surface of the mask substrate and a sidewall surface of the absorption structure.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2018 Application Filing Year
- G03F Class
- 2098 Applications Filed
- 1510 Patents Issued To-Date
- 71.98 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G03F Class
- 0 % this patent is cited more than
- 5 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Apr 13, 2028 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Apr 13, 2032 |
