Photomask laser etch
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United States of America Patent
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Oct 13, 2020
Grant Date -
N/A
app pub date -
Jul 12, 2019
filing date -
Aug 16, 2018
priority date (Note) -
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Abstract
Embodiments described herein relate to apparatus and methods for removing one or more films from a photomask to create a black border and one or more pellicle anchor areas thereon. A photomask substrate is exposed by removing the one or more films in the black border and pellicle anchor areas. The black border prevents a pattern on the photomask from overlapping a pattern on a substrate being processed. To create the black border and pellicle anchor areas, a laser beam is projected through a lens and focused on a surface of the films. The films are ablated by the laser beam without damaging the photomask substrate.
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