Device and method for continuous production of porous silicon layers
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United States of America Patent
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Sep 29, 2020
Grant Date -
Jul 21, 2016
app pub date -
Sep 29, 2014
filing date -
Oct 1, 2013
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Abstract
The invention relates to a device and a method for continuous production of porous silicon layers (single or multiple layers) on workpieces made of silicon or workpieces with a silicon coating. The method according to the invention is thereby based on a one-sided etching method, the workpiece being guided horizontally, by means of a transport device, with the front side of the workpiece to be etched, past at least one etching chamber, comprising an electrolyte and a cathode. This method can be used in particular for the production of PV cells.
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