Method for producing a reflection-reducing layer system

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United States of America Patent

PATENT NO 10782451
SERIAL NO

16469619

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Abstract

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A method for producing a reflection-reducing layer system is disclosed. In an embodiment, a method includes depositing an organic layer on the substrate, generating a nanostructure in the organic layer by a plasma etching process, applying a cover layer to the nanostructure, wherein the organic layer, the nanostructure and the cover layer together form a reflection-reducing structure, wherein the cover layer comprises an inorganic material or an organosilicon compound, and wherein the cover layer is at least 5 nm thick and performing a post-treatment after applying the cover layer, wherein a material of the organic layer is at least partially removed, decomposed or chemically converted, and wherein an effective refractive index neff,2 of the reflection-reducing structure after the post-treatment is smaller than an effective refractive index neff,1 of the reflection-reducing structure before the post-treatment.

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Patent Owner(s)

Patent OwnerAddress
FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E VHANSASTRASSE 27C MUNICH 80686

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Knopf, Heiko Jena, DE 3 10
Munzert, Peter Jena, DE 20 131
Rickelt, Friedrich Jena, DE 9 41
Schulz, Ulrike Jena, DE 26 158
Wolleb, Sabrina Jena, DE 1 0

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