Photocuring method, compound and composition used therein

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United States of America Patent

PATENT NO 10774062
APP PUB NO 20190055210A1
SERIAL NO

16072794

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An object of the present invention is to provide a photocuring method, which makes it possible to rapidly and efficiently obtain a crosslinked product (resin), a compound used in the photocuring method, and a photocuring resin composition containing the compound.

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Patent Owner(s)

Patent OwnerAddress
TOKYO UNIVERSITY OF SCIENCE FOUNDATION1-3 KAGURAZAKA SHINJUKU-KU TOKYO 1628601
FUJIFILM WAKO PURE CHEMICAL CORPORATION1-2 DOSHOMACHI 3-CHOME CHUO-KU OSAKA-SHI OSAKA 5408605

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arimitsu, Koji Tokyo, JP 26 62
Imazeki, Shigeaki Saitama, JP 11 72
Sakai, Nobuhiko Saitama, JP 11 56
Yanaba, Kosuke Saitama, JP 8 26

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