Method of forming topcoat for patterning
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United States of America Patent
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Aug 25, 2020
Grant Date -
May 3, 2018
app pub date -
Aug 24, 2017
filing date -
Nov 2, 2016
priority date (Note) -
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Abstract
Disclosed is a method for the fabrication of polymeric topcoat via initiated chemical vapor deposition (iCVD) or photoinitiated chemical vapor deposition (piCVD) in conjunction with directed self-assembly (DSA) of block copolymers to generate high resolution patterns. A topcoat deposited by iCVD or piCVD allows for conformal, ultra-thin, uniform, pinhole-free coatings. iCVD or piCVD topcoat enables the use of a diversity of block copolymer (BCP) materials for DSA and facilitates the direct and seamless integration of the topcoats for a pattern transfer process.
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