Inorganic graded barrier film and methods for their manufacture
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United States of America Patent
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Aug 18, 2020
Grant Date -
Jun 23, 2011
app pub date -
Apr 28, 2009
filing date -
Apr 29, 2008
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Abstract
The present invention refers to a graded barrier film comprising a layered structure, wherein the layered structure comprises a first layer consisting of metal oxide; an intermediate layer consisting of metal nitride or metal oxynitride which is arranged on the first layer; and a third layer consisting of a metal oxide which is arranged on the intermediate layer. The present invention further refers to a sputtering method for manufacturing this graded barrier film and a device encapsulated with this graded barrier film.
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