Spectrally and temporally engineered processing using photoelectrochemistry

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United States of America Patent

PATENT NO 10734237
APP PUB NO 20180301344A1
SERIAL NO

15986304

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Abstract

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Methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate and for additively depositing metal and dopant atoms onto the surface and for diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, and a spatial pattern of electron-hole pairs is generated by projecting a spatial pattern of illumination characterized by a specified intensity, wavelength and duration at each pixel of a plurality of pixels on the surface. Charge carriers are driven away from the surface of the semiconductor on a timescale short compared to the carrier recombination lifetime. Such methods are applied to creating a spatially varying doping profile in the semiconductor substrate, a photonic integrated circuit and an integrated photonic microfluidic circuit.

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Patent Owner(s)

Patent OwnerAddress
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS352 HENRY ADMINISTRATION BUILDING 506 SOUTH WRIGHT STREET URBANA IL 61801

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Carlson, Catherine Britt Saint Joseph, US 2 4
Edwards, Chris Chandler, US 17 91
Edwards, Lonna Louisville, US 2 6
Goddard, Lynford Champaign, US 9 72
Koker, Terry Gibson City, US 2 6
Lee, Julianne Savoy, US 2 4
Liu, Gang Logan Champaign, US 12 104
Srivastava, Shailendra Urbana, US 23 53
Wang, Kaiyuan Atlanta, US 6 6
Washington, Samuel Urbana, US 2 4
Yu, Xin Urbana, US 196 1185

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