Method for monitoring nanometric structures

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United States of America Patent

PATENT NO 10731979
APP PUB NO 20190219390A1
SERIAL NO

15870622

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Abstract

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A method for monitoring a first nanometric structure formed by a multiple patterning process, the method may include performing a first plurality of measurements to provide a first plurality of measurement results; wherein the performing of the first plurality of measurements comprises illuminating first plurality of locations of a first sidewall of the first nanometric structure by oblique charged particle beams of different tilt angles; and processing, by a hardware processor, the first plurality of measurement results to determine a first attribute of the first nanometric structure.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS ISRAEL LTDTHE CITY OF ISRAEL HARVARD REHOVOT CENTRAL DISTRICT

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kris, Roman Jerusalem, IL 19 35
Levi, Shimon Kiryat-Tivon, IL 10 57
Schwarzband, Ishai Or-Yehuda, IL 25 136

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