Mask blank having a resist layer, method for manufacturing mask blank having resist layer, and method for manufacturing transfer mask
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United States of America Patent
Stats
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Jul 14, 2020
Grant Date -
Nov 22, 2018
app pub date -
Nov 7, 2016
filing date -
Nov 18, 2015
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A mask blank having a resist layer, which enables charge-up to be suppressed during electron beam irradiation. The mask blank having a resist layer includes a substrate having a thin film, a resist layer formed on a surface of the thin film, and a conductive layer formed on the resist layer. The conductive layer includes a first metal layer containing aluminum as a main component thereof and a second metal layer made of a metal other than aluminum. The first metal layer is formed on the resist layer side of the second metal layer.
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International Classification(s)
- 2016 Application Filing Year
- G03F Class
- 1979 Applications Filed
- 1508 Patents Issued To-Date
- 76.21 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G03F Class
- 0 % this patent is cited more than
- 5 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jan 14, 2028 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jan 14, 2032 |
