Mask bias approximation

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United States of America Patent

PATENT NO 10705420
APP PUB NO 20190354005A1
SERIAL NO

15979751

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Abstract

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Directly biasing a mask image is disclosed. A method includes generating a mask image for the mask, biasing the mask image to obtain a biased mask image, and simulating the biased mask image to obtain a wafer image to be compared to the design pattern. Biasing the mask image includes updating at least one pixel of the mask image using an interpolation of neighboring pixels of the at least one pixel, the interpolation being dependent on a predetermined value.

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Patent Owner(s)

Patent OwnerAddress
ASML US LLC F/K/A ASML US INC2650 WEST GERONIMO PLACE CHANDLER AS 85224

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cao, Yang San Jose, US 306 2907
Huang, Jihui San Jose, US 5 19
Lan, Song San Jose, US 42 63
Zhao, Ke San Jose, US 30 93

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