Coating compositions suitable for use with an overcoated photoresist
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United States of America Patent
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Jul 7, 2020
Grant Date -
Nov 2, 2017
app pub date -
Jul 17, 2017
filing date -
Jun 12, 2009
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Abstract
In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
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