Hardmask composition, method of forming pattern by using the hardmask composition, and hardmask formed using the hardmask composition
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United States of America Patent
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Jun 16, 2020
Grant Date -
Jan 31, 2019
app pub date -
Jul 16, 2018
filing date -
Jul 27, 2017
priority date (Note) -
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status (Latency Note)
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Abstract
Provided are a hardmask composition, a method of forming a pattern using the hardmask composition, and a hardmask formed using the hardmask composition. The hardmask composition includes a polar nonaqueous organic solvent and one of: i) a mixture of graphene quantum dots and at least one selected from a diene and a dienophile, ii) a Diels-Alder reaction product of the graphene quantum dots and the at least one selected from a diene and a dienophile, iii) a thermal treatment product of the Diels-Alder reaction product of graphene quantum dots and the at least one selected from a diene and a dienophile, or iv) a combination thereof.
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International Classification(s)
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- B82Y:SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; ....
- C07C:ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07B:GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS TH....
- G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....
- C08L:COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
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