Substrate processing apparatus and substrate processing method
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United States of America Patent
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Jun 2, 2020
Grant Date -
Mar 29, 2018
app pub date -
Sep 20, 2017
filing date -
Sep 26, 2016
priority date (Note) -
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Abstract
A substrate processing apparatus according to the present disclosure includes a holding unit, a nozzle, a driving unit, and a controller. The holding unit holds a substrate. The nozzle supplies a processing liquid to the substrate held on the holding unit. The driving unit moves the nozzle. The controller controls the driving unit, so as to move the nozzle while supplying the processing liquid to the substrate from the nozzle. Further, the controller controls the driving unit based on recipe information including step information including positions of first and second points above the substrate, total time for moving the nozzle between the first and second points, and a moving speed of the nozzle, so as to cause reciprocation of the nozzle.
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