Oxidizing fluid for the chemical-mechanical polishing of ceramic materials
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United States of America Patent
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May 19, 2020
Grant Date -
Nov 29, 2018
app pub date -
May 24, 2018
filing date -
May 25, 2017
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Abstract
The present disclosure is directed to a fluid composition that can be used in chemical-mechanical polishing processes of inorganic material. The fluid composition can include at least one oxidizing agent and a multivalent cation component. Using the fluid composition during a chemical-mechanical polishing process can facilitate a relatively defect free material surface after polishing while achieving a suitable material removal rate.
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