Charged particle beam writing apparatus and charged particle beam writing method
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United States of America Patent
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Apr 14, 2020
Grant Date -
Jun 20, 2019
app pub date -
Nov 28, 2018
filing date -
Dec 14, 2017
priority date (Note) -
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Abstract
In one embodiment, a charged particle beam writing apparatus includes a deflector deflecting a charged particle beam, a first correcting lens and a second correcting lens correcting a focus position of the charged particle beam, a focus correction amount calculator calculating a first correction amount for the focus position according to a change in a height position of a sample surface, and calculating a second correction amount for the focus position according to a change in shot size of the charged particle beam, a first DAC (digital to analog converter) amplifier applying a voltage for a ground potential based on the first correction amount to the first correcting lens, and a second DAC amplifier applying a voltage for a ground potential based on the second correction amount to the second correcting lens, an output of the second DAC amplifier being smaller than an output of the first DAC amplifier.
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