Method of bias temperature instability calculation and prediction for MOSFET and FinFET
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United States of America Patent
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Apr 14, 2020
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app pub date -
Mar 20, 2017
filing date -
Mar 20, 2017
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Abstract
A method, a system and a non-transitory machine-readable storage medium are provided. In one or more aspects, a computer-implemented method for bias temperature instability (BTI) calculation of a device includes simulating the device, using an electronic design automation tool. The simulation includes determining a first degradation value after applying a first sequence of stress values to the device for a first plurality of time steps. The simulation further includes determining a first degradation recovery value after the first plurality of time steps. The simulation further includes determining a first recovered degradation value after the first plurality of time steps by combining the first degradation value and the first degradation recovery value. The first degradation value, the first degradation recovery value, and the first recovered degradation value are associated with one or more model parameters of the device. The simulation is a transient analysis simulation, and the device is a FINFET or MOSFET device.
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