Mask blank with resist film and method for manufacturing the same and method for manufacturing transfer mask

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United States of America

PATENT NO 10578960
APP PUB NO 20170168382A1
SERIAL NO

15327519

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Abstract

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A mask blank with resist film, including a substrate having a thin film; and a negative resist film formed on a main surface of the thin film, wherein in the resist film, a photoacid generator-rich region in which concentration of a photoacid generator is high compared to other region of the resist film, is formed at a portion where the resist film is in contact with the thin film.

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Patent Owner(s)

Patent OwnerAddress
HOYA CORPORATION6-10-1 NISHI-SHINJUKU SHINJUKU-KU SHINJUKU-KU TOKYO 160-8347

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fukui, Toru Tokyo, JP 7 53

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