Method of inspecting semiconductor substrate and method of manufacturing semiconductor device
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
Jan 21, 2020
Grant Date -
Mar 28, 2019
app pub date -
Feb 2, 2018
filing date -
Feb 2, 2018
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method of inspecting a semiconductor substrate includes measuring light intensity of light reflected on the rotating semiconductor substrate, analyzing a frequency distribution of the measured light intensity, and determining a state of the semiconductor substrate by using the frequency distribution. The analyzing of the frequency distribution of the measured light intensity includes extracting a plurality of frequency components corresponding respectively to a plurality of frequencies from the measured light intensity.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully