Gas distribution unit for fluidized bed reactor system, fluidized bed reactor system having the gas distribution unit, and method for preparing granular polycrystalline silicon using the fluidized bed reactor system

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United States of America

PATENT NO 10518237
SERIAL NO

15549759

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Abstract

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The present invention relates to a gas distribution unit for a fluidized bed reactor system, a fluidized bed reactor system having the gas distribution unit, and a method for preparing granular polysilicon using the fluidized bed reactor system. The gas distribution unit for a fluidized bed reactor system according to the present invention enables gas flow rate control and gas composition control for each zone within the plenum chamber. In addition, a fluidized bed reactor system having the gas distribution unit enables shape control of a fluidized bed (in particular, transition between a bubbling fluidized bed and a spout fluidized bed). The method for preparing granular polysilicon using the fluidized bed reactor system not only simultaneously improves process stability and productivity, but also enables more flexible handling in the event of an abnormal situation.

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Patent Owner(s)

Patent OwnerAddress
HANWHA CHEMICAL CORPORATIONSEOUL 04541

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ahn, Gui Ryong Daejeon, KR 14 39
Han, Joo Hee Seoul, KR 18 112
Kim, Gil Ho Daejeon, KR 15 25
Kim, Ji Ho Suncheon-si, KR 124 501
Kim, Sang ah Incheon, KR 7 6
Lee, Won Ik Seoul, KR 11 29

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