Metal-insulator-metal capacitor with improved time-dependent dielectric breakdown
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
N/A
Issued Date -
N/A
app pub date -
Oct 23, 2017
filing date -
Oct 23, 2017
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A reliable metal insulator metal (MIM) capacitor is disclosed. The MIM capacitor is disposed over at least an interlevel dielectric (ILD) layer of a plurality of ILD layers with interconnects disposed over a substrate. The MIM capacitor includes a capacitor dielectric disposed between top and bottom metal capacitor electrodes. The edges of the top metal electrode at the interface with the capacitor dielectric are rounded. The rounded edges of the top capacitor electrode at the interface with the capacitor dielectric reduce edge electric field, thereby improves time-dependent dielectric breakdown (TDDB) reliability of the capacitor.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully