Conductive composition, antistatic film, laminate and production therefor, and production method for photomask

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United States of America Patent

PATENT NO 10488757
APP PUB NO 20170261854A1
SERIAL NO

15309973

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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This conductive composition includes: a conductive polymer (a) having a sulfonic acid group and/or a carboxy group; a basic compound (b) having at least one nitrogen-containing heterocyclic ring and an amino group; an aqueous polymer (c) having a hydroxyl group (excluding the conductive polymer (a)); a hydrophilic organic solvent (d); and water (e).

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI CHEMICAL CORPORATION1-1 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 100-8251

International Classification(s)

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  • 2015 Application Filing Year
  • C08G Class
  • 2777 Applications Filed
  • 2224 Patents Issued To-Date
  • 80.09 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances201520162017201820192020202120222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fukuda, Hiroya Toyohashi, JP 21 121
Uzawa, Masashi Toyohashi, JP 26 114
Yamazaki, Akira Toyohashi, JP 205 3133

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Patent Citation Ranking

  • 0 Citation Count
  • C08G Class
  • 0 % this patent is cited more than
  • 6 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges79673821351101 - 1011 - 2021 - 3031 - 4041 - 5051 - 60050100150200250300350400450500550600650700750800850

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