Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
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United States of America Patent
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Nov 19, 2019
Grant Date -
Mar 22, 2012
app pub date -
Aug 3, 2011
filing date -
Feb 12, 2009
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Abstract
An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.
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