Method and apparatus for measuring surface properties of polishing pad
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United States of America Patent
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Nov 19, 2019
Grant Date -
Jun 30, 2016
app pub date -
Dec 18, 2015
filing date -
Dec 26, 2014
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Abstract
A polishing pad surface property measuring method which can measure surface properties of a polishing pad that reflect CMP performance by applying a laser beam to the polishing pad at a plurality of incident angles is disclosed. The method includes applying a laser beam to a surface of the polishing pad, and receiving light reflected by the surface of the polishing pad and performing Fourier transform on the received light to determine surface properties of the polishing pad. The laser beam is applied to the polishing pad at a plurality of incident angles.
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