Method for evaluating quality of oxide semiconductor thin film, method for managing quality of oxide semiconductor thin film, and device for manufacturing semiconductor using said method for managing quality

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United States of America Patent

PATENT NO 10475711
APP PUB NO 20190122941A1
SERIAL NO

16096093

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Abstract

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A quality evaluation method for an oxide semiconductor thin film includes: selecting a peak value having a largest calculated value and a time constant for the peak value among calculated values obtained by substituting each signal value for respective elapsed times after stopping excitation light irradiation and the corresponding elapsed time into the following Equation (1); and estimating, from the peak value and the time constant, an energy level of defect state and the defect density in the oxide semiconductor thin film:

description='In-line Formulae' end='lead'x=(signal value)×(elapsed time for the signal value)  Equation 1.description='In-line Formulae' end='tail'

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Patent Owner(s)

Patent OwnerAddress
KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL LTD )2-4 WAKINOHAMA-KAIGANDORI 2-CHOME CHUO-KU KOBE-SHI HYOGO 6518585 ?6518585

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hayashi, Kazushi Hyogo, JP 37 528
Kugimiya, Toshihiro Hyogo, JP 78 1170
Ochi, Mototaka Hyogo, JP 37 304

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