Method for patterning amorphous alloy, amorphous alloy pattern structure using the same, dome switch, and method for manufacturing dome switch
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United States of America Patent
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Nov 5, 2019
Grant Date -
Jan 5, 2017
app pub date -
Apr 11, 2016
filing date -
Jul 1, 2015
priority date (Note) -
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status (Latency Note)
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Abstract
A method for patterning an amorphous alloy is provided. The method includes forming a pattern for defining an amorphous alloy deposition region on a parent material, forming an amorphous alloy deposition layer on the parent material with the pattern formed thereon, and etching a region except for the amorphous alloy deposition region. A dome switch is provided. The dome switch includes a metal layer shaped like a dome, a central portion of which protrudes, and, in response to external force being received through the protruding central portion, the central portion contacting and electrically connected to a circuit board, and an amorphous alloy layer disposed on the metal layer. Accordingly, an amorphous alloy structure with enhanced durability and reliability is easily manufactured.
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