Method and device for processing photoresist component
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United States of America Patent
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Nov 5, 2019
Grant Date -
Jul 5, 2018
app pub date -
Aug 17, 2017
filing date -
Jan 3, 2017
priority date (Note) -
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Abstract
The present disclosure provides a method for processing a photoresist component, including steps of: placing a photoresist component to be processed on a heating device comprising a plurality of heating components; and controlling, based on a heating parameter, each of the plurality of heating components associated with the heating parameter to heat the photoresist component to be processed. The heating parameter is determined based on a photoresist component parameter of the photoresist component to be processed and a process parameter of forming the photoresist component. The present disclosure further provides a device for processing a photoresist component.
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