SiC single crystal and method for producing same

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United States of America Patent

PATENT NO 10450671
APP PUB NO 20160237590A1
SERIAL NO

15023981

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Abstract

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Provided is a SiC single crystal that has a large growth thickness and contains no inclusions. A SiC single crystal grown by a solution process, wherein the total length M of the outer peripheral section formed by the {1-100} faces on the {0001} growth surface of the SiC single crystal, and the length P of the outer periphery of the growth surface of the SiC single crystal, satisfy the relationship M/P≤0.70, and the length in the growth direction of the SiC single crystal is 2 mm or greater.

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Patent Owner(s)

Patent OwnerAddress
TOYOTA JIDOSHA KABUSHIKI KAISHATOYOTA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Daikoku, Hironori Susono, JP 34 63
Kado, Motohisa Gotenba, JP 22 37
Kamei, Kazuhito Tokyo, JP 38 209
Kusunoki, Kazuhiko Tokyo, JP 40 137

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