Polyamide 6 resins containing a low level of polyamide 66 comonomer

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United States of America Patent

PATENT NO 10442928
APP PUB NO 20180030271A1
SERIAL NO

15650407

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Abstract

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Compositions of polyamide resins containing a low level of polyamide 66 comonomer are provided, which are useful in producing blown films. A method of forming a blown film includes: extruding a polyamide copolymer to form a polyamide film. The polyamide copolymer is formed from a mixture of caprolactam and hexamethylenediamine adipate where the caprolactam comprises from 85 mol. % to 99 mol. % of the total moles of caprolactam and hexamethylenediamine adipate.

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Patent Owner(s)

Patent OwnerAddress
ADVANSIX RESINS & CHEMICALS LLC300 KIMBALL DRIVE PARSIPPANY NJ 07054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Barthe, Stephanie C Richmond, US 3 2
Liu, Haoyu Midlothian, US 16 20
Nelliappan, Veera Richmond, US 20 35
Park, Kuil Midlothian, US 4 2
Porter, Simon J Chesterfield, US 25 164

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