Plasma accelerating apparatus and plasma accelerating method

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United States of America Patent

PATENT NO 10436183
APP PUB NO 20190010933A1
SERIAL NO

16066899

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Abstract

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A plasma accelerating apparatus includes: a cathode (11) configured to supply electrons to a plasma acceleration region; an anode (12); a power supply (13) configured to apply a voltage between the cathode and the anode; a supply port (14) arranged on an outer circumference side of the cathode to supply a propellant to the plasma acceleration region; and a first magnetic field generator (15) configured to generate a first axial direction magnetic field in the upstream side region of the plasma acceleration region to suppress electrons supplied from the cathode from heading for the anode. Thus, the plasma accelerating apparatus and the plasma accelerating method having high thrust efficiency is provided.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI HEAVY INDUSTRIES LTD2-3 MARUNOUCHI 3-CHOME CHIYODA-KU TOKYO 100-8332
NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY1 FURO-CHO CHIKUSA-KU NAGOYA-SHI AICHI 4648601

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ichihara, Daisuke Aichi, JP 1 0
Iwakawa, Akira Aichi, JP 3 1
Iwasaki, Tomoji Tokyo, JP 1 0
Mizutani, Keisuke Aichi, JP 20 18
Sasahara, Matsutaka Tokyo, JP 1 0
Sasoh, Akihiro Aichi, JP 3 5
Yamazaki, Takuya Tokyo, JP 87 733
Yasui, Masaaki Tokyo, JP 5 29

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