Oriented alumina substrate for epitaxial growth

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United States of America Patent

PATENT NO 10435816
APP PUB NO 20180179665A1
SERIAL NO

15902294

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Abstract

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An oriented alumina substrate for epitaxial growth according to an embodiment of the present invention includes crystalline grains constituting a surface thereof, the crystalline grains having a tilt angle of 1° or more and 3° or less and an average sintered grain size of 20 μm or more.

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NGK INSULATORS LTD2-56 SUDA-CHO MIZUHO-KU NAGOYA-SHI AICHI-PREFECTURE 467-8530

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Matsushima, Kiyoshi Nagoya, JP 18 29
Nanataki, Tsutomu Toyoake, JP 278 3315
Sato, Kei Tokai, JP 208 1655
Watanabe, Morimichi Nagoya, JP 66 600

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