Method of resolving color conflicts for cell-based designs with multi-pattern lithography
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United States of America
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Sep 10, 2019
Grant Date -
May 26, 2016
app pub date -
Aug 17, 2015
filing date -
Aug 17, 2015
priority date (Note) -
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Abstract
According to one general aspect, a method may include receiving a data file that includes placement data regarding a plurality of circuit cells. The circuit cells may include respective layout portions. The layout portions may be associated with a plurality of respective lithographic colors. The method may include determining if a violating circuit cell is to be re-colored. The method may include indicating that, via at least one shape on a color swap layer in the data file, the violating circuit cell is to be at least partially re-colored. A color swap layer shape may cause a mask generator to re-color the portion of the violating circuit cell indicated by the color swap layer shape.
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