Physical face cloning

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United States of America Patent

PATENT NO 10403404
APP PUB NO 20150317451A1
SERIAL NO

14797755

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Abstract

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A computer-implemented method is provided for physical face cloning to generate a synthetic skin. Rather than attempt to reproduce the mechanical properties of biological tissue, an output-oriented approach is utilized that models the synthetic skin as an elastic material with isotropic and homogeneous properties (e.g., silicone rubber). The method includes capturing a plurality of expressive poses from a human subject and generating a computational model based on one or more material parameters of a material. In one embodiment, the computational model is a compressible neo-Hookean material model configured to simulate deformation behavior of the synthetic skin. The method further includes optimizing a shape geometry of the synthetic skin based on the computational model and the captured expressive poses. An optimization process is provided that varies the thickness of the synthetic skin based on a minimization of an elastic energy with respect to rest state positions of the synthetic skin.

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Patent Owner(s)

Patent OwnerAddress
ETH ZURICH (EIDGENONESSISCHE TECHNISCHE HOCHSCHULE ZURICH)RAEMISTRASSE 101 ZURICH 8092
THE WALT DISNEY (SWITZERLAND) GMBHHOESCHGASSE 45 ZURICH CH-8008

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Beeler, Thabo Dominik Savognin, CH 8 115
Bickel, Bernd Zurich, CH 28 379
Bradley, Derek Edward Zurich, CH 44 85
Gross, Markus Uster, CH 131 1896
Jackson, Philip John Glendale, US 14 125
Kaufmann, Peter Liebefeld, CH 47 276
Marschner, Stephen R Ithaca, US 2 23
Matusik, Wojciech Lexington, US 119 3069
Thomaszewski, Bernhard Zurich, CH 15 146

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