Mechanical isolation control for an extreme ultraviolet (EUV) pellicle
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United States of America Patent
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Aug 20, 2019
Grant Date -
May 10, 2018
app pub date -
Jan 3, 2018
filing date -
Sep 24, 2015
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Abstract
Systems and methods for isolating a membrane during fabrication. The membrane is connected to a substrate wafer using a plurality of magnets of uniform dimensions formed into two or more magnet stack beams. The magnet stack beams provide a gap between the wafer and the membrane. The wafer connected to the membrane by the magnet stack beams is received by a substrate holder so that a space is present between the membrane and the substrate holder. The membrane is rinsed by immersing, soaking, and withdrawing the substrate holder and the wafer connected to the membrane by the magnet stack beams using a rinse bath solution.
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