Resist composition, method for forming resist pattern, polyphenol derivative for use in the composition

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United States of America Patent

PATENT NO 10377734
APP PUB NO 20150376157A1
SERIAL NO

14766658

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Abstract

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The present invention provides a resist composition which is excellent in heat resistance, has high solubility in a safe solvent, has high sensitivity, and can impart a good shape to a resist pattern. Such a resist composition contains a compound represented by the following general formula (1) or (2):

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI GAS CHEMICAL COMPANY INC5-2 MARUNOUCHI 2-CHOME CHIYODA-KU TOKYO 1008324 ?1008324

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Echigo, Masatoshi Kanagawa, JP 137 625
Yamakawa, Masako Kanagawa, JP 10 137

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