Spacer wafer for wafer-level camera and method for manufacturing same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 23, 2019
Grant Date -
Jun 15, 2017
app pub date -
Feb 28, 2017
filing date -
Nov 10, 2011
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A spacer wafer for a wafer-level camera, a wafer-level camera including the spacer wafer and a method of manufacturing a spacer wafer include a layer of photoresist being formed over a substrate, the layer of photoresist being exposed to radiation through a mask that defines a spacer geometry for at least one wafer-level camera element. The layer photoresist is developed, such that the layer of photoresist is the spacer wafer for the wafer-level camera.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully