Photomask and a fabrication method therefor
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United States of America Patent
Stats
-
Jul 9, 2019
Grant Date -
May 31, 2018
app pub date -
Jan 5, 2017
filing date -
Nov 29, 2016
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A method of fabricating a photomask includes depositing a phase shifter over a light transmitting substrate, depositing a shading layer over the light transmitting substrate, and removing a portion of the shading layer and a portion of the phase shifter to expose a portion of the light transmitting substrate. The phase shifter having at least two semiconductor layers and at least two dielectric layers.
First Claim
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International Classification(s)
- 2017 Application Filing Year
- H01L Class
- 30754 Applications Filed
- 25260 Patents Issued To-Date
- 82.14 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 6 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jan 9, 2027 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jan 9, 2031 |
