Method for forming conductive pattern by direct radiation of electromagnetic wave, and resin structure having conductive pattern thereon

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United States of America Patent

PATENT NO 10344385
APP PUB NO 20160194759A1
SERIAL NO

14910966

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Abstract

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Provided are a method for forming conductive pattern by direct radiation of an electromagnetic wave capable of forming fine conductive patterns on various kinds of polymer resin products or resin layers by a simplified process, and appropriately implementing the polymer resin products having white color or various colors, and the like, even without containing specific inorganic additives in the polymer resin itself, and a resin structure having the conductive pattern formed therefrom.

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Patent Owner(s)

Patent OwnerAddress
LG CHEM LTDYOUNGDUNGPO-GU SEOUL 150-721

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jeong, Han Nah Daejeon, KR 25 37
Jun, Shin Hee Daejeon, KR 29 46
Jung, Sang Yun Daejeon, KR 21 88
Kim, Jae Hyun Daejeon, KR 259 2059
Kim, Jae Jin Daejeon, KR 69 385
Lee, Su Jeong Daejeon, KR 19 20
Park, Chee-Sung Daejeon, KR 18 35
Park, Cheol-Hee Daejeon, KR 79 245
Seong, Eun Kyu Daejeon, KR 14 14

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