Mirror, in particular for a microlithographic projection exposure apparatus
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United States of America Patent
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Jun 25, 2019
Grant Date -
Aug 2, 2018
app pub date -
Jan 15, 2018
filing date -
Jul 15, 2015
priority date (Note) -
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Abstract
A mirror, in particular for a microlithographic projection exposure apparatus, has an optically effective surface, a mirror substrate (205, 305), a reflection layer (220, 320), which is configured to provide the mirror with a reflectivity of at least 50% for electromagnetic radiation with a predetermined operating wavelength incident on the optically effective surface (200a, 300a) at angles of incidence in relation to the respective surface normals of at least 65°, and a substrate protection layer (210, 310) which is arranged between the mirror substrate (205, 305) and the reflection layer (220, 320). The substrate protection layer has a transmission of less than 0.1% for EUV radiation.
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