Injector for forming films respectively on a stack of wafers

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United States of America Patent

PATENT NO 10316411
APP PUB NO 20150191820A1
SERIAL NO

14665346

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Abstract

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An injector for forming films respectively on a stack of wafers is provided. The injector includes a plurality of hole structures. Every adjacent two of the wafers have therebetween a wafer spacing, and each of the wafers has a working surface. The hole structures respectively correspond to the respective wafer spacings. The working surface and a respective hole structure have therebetween a parallel distance. The parallel distance is larger than a half of the wafer spacing. A wafer processing apparatus and a method for forming films respectively on a stack of wafers are also provided.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsieh, Wei-Che New Taipei, TW 26 33
Huang, Tai-Chun Hsinchu, TW 170 1430
Lee, Tze-Liang Hsinchu, TW 403 4505
Lien, Hao-Ming Hsinchu, TW 34 329
Lin, Yi-Hung Taipei, TW 156 824
Tsai, Shiang-Rung Hsinchu, TW 7 38
Wang, Brian Hsinchu County, TW 21 504

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