Absorbing reflector for semiconductor processing chamber
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United States of America Patent
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May 28, 2019
Grant Date -
Mar 22, 2018
app pub date -
Nov 28, 2017
filing date -
Jun 21, 2013
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Abstract
Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.
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