Lithographic apparatus

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United States of America Patent

PATENT NO 10268128
APP PUB NO 20180196361A1
SERIAL NO

15742168

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Abstract

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A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
De, La Rosette Johannes Paul Marie Venlo, NL 2 2
Janssen, Franciscus Johannes Joseph Geldrop, NL 49 475
Kadijk, Edwin Cornelis Eindhoven, NL 14 142
Lallemant, Nicolas Alban Veldhoven, NL 7 32
Liefooghe, Jan Knesselare, BE 1 1
Matthes, Markus Rolf Werner Cologne, DE 1 1
Muitjens, Marcel Johannus Elisabeth Hubertus Nuth, NL 11 42
Steijns, Hubert Matthieu Richard Veldhoven, NL 4 40
Van, De Velde André Gillis Veldhoven, NL 1 1
Van, Den Brink Marinus Aart Moergestel, NL 19 913

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