Plasma processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10229814
APP PUB NO 20130115780A1
SERIAL NO

13661118

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A plasma processing apparatus has a circular chamber having an opening portion which serves as a plasma ejection port surrounded by a dielectric member, a gas supply pipe for introducing gas into the inside of the chamber, a coil provided in the vicinity of the chamber, a high-frequency power supply connected to the coil, and a base material mounting table.

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Patent Owner(s)

Patent OwnerAddress
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTDOSAKA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kawaura, Hiroshi Kanagawa, JP 10 81
Okumura, Tomohiro Osaka, JP 151 1895
Yukimoto, Tetsuya Chiba, JP 6 76

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