Substrate processing system with lamphead having temperature management
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United States of America Patent
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Feb 12, 2019
Grant Date -
Nov 14, 2013
app pub date -
Apr 18, 2013
filing date -
Apr 26, 2012
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Abstract
Apparatus for processing a substrate are provided herein. In some embodiments, a lamphead for use in substrate processing includes a monolithic member having a contoured surface; a plurality of reflector cavities disposed in the contoured surface, wherein each reflector cavity is shaped to act as a reflector or to receive a replaceable reflector for a lamp; and a plurality of lamp passages, wherein each lamp passage extends into the monolithic member from one of the plurality of reflector cavities.
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